Thin films are something that is very close to the atomic dimensions in thickness, therefore if it is possible to further reduce the width of these, in a controlled way and monitor the behavior of some physical law associated with the variation in thickness, the results can be as expected or maybe adjustments must be applied. For this reason in this work, thin films of titanium dioxide (TiO2) are studied, deposited by laser ablation, on glass substrates in the form of prismatic figures. The main objective was to confine the plasma plume to produce a continuous trail with varying thicknesses that could be analyzed. Growth times of the films were 5, 10, 15, 20 and 30 minutes at room temperature in a low vacuum. The deposited films presented a color pattern related to the expected thickness variation, thus the theory of optical interference was applied to the continuous trace to calculate thicknesses. Characterization process was carried out by: X-ray diffraction to know the crystalline structure of the films, ultraviolet-visible spectroscopy to verify the variation of thicknesses, X-ray photoelectron spectroscopy to know the composition and scanning electron microscopy, to measure the thicknesses of the films transversely.