Characterization of Ta/TaN multi-graded thin film coating synthesized by HiPIMS technique
Data files
Oct 04, 2023 version files 1.56 MB
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Figure_3._XRD_reflection_of_AISI_52100_and_TaTaN_multilayer_thin_film_coatings.xlsx
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Figure_4._Critical_load_values_and_failure_modes_of_TaTaN_multilayer_thin_films.xlsx
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Figure_5._The_coefficient_of_friction_of_AISI_52100_steel_and_TaTaN_coatings_for_R1__R2__and_R3_samples..xlsx
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README.md
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Table_1-_EDS_Results_for_R1.csv
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Table_1-_EDS_Results_for_R2.csv
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Table_1-_EDS_Results_for_R3.csv
Abstract
This research aims to synthesize and characterize the multi-graded Ta/TaN thin film coatings on AISI 52100 steel, employing the High Power Impulse Magnetron Sputtering technique. The investigation includes the microstructure, coating thickness, elemental composition, microhardness, and tribological performance using SEM, EDS, XRD, microhardness tester, and pin-on-disc tester, respectively.
README
This Readme.txt file was generated on 21.09.2023 by Maleque
GENERAL INFORMATION
- Title of Dataset: Characterization of Ta/TaN Multi-graded Thin Film Coating Synthesized by HiPIMS Technique
Author Information
Name: Muhammed Alperen POLAT
Institution: Atatürk University
Mail: muhammedalperen.polat11@ogr.atauni.edu.trName: Ihsan Efeoglu
Institution: Atatürk University
Mail: iefeoglu@atauni.edu.trName: Md Abdul Maleque
Institution: International Islamic University Malaysia
Mail: : maleque@iium.edu.myName: Gokhan GULTEN
Institution: Atatürk University
Mail: gokhan.gulten@atauni.edu.trName: Yasar Totik
Institution: Atatürk University
Mail: ytotik@atauni.edu.trName: Masjuki Haji Hassan
Institution: International Islamic University Malaysia
Mail: masjuki@iium.edu.myName: Nurin Wahidah Zulkifli
Institution: University of Malaya
Mail:nurinmz@um.edu.my
Date of data collection: 06-2022
This manuscript does not receive external funding.
DATA & FILE OVERVIEW
- TABLE 1- EDS RESULTS FOR R1 The SEM was employed to investigate the elemental compositions of the coatings (R1)
2- TABLE 1- EDS RESULTS FOR R2
The SEM was employed to investigate the elemental compositions of the coatings (R2)
3- TABLE 1- EDS RESULTS FOR R3
The SEM was employed to investigate the elemental compositions of the coatings (R3)
4-Figure 3. XRD reflection of AISI 52100 and TaTaN multilayer thin film coatings (52100, R1, R2, R3)
In this data presents the XRD reflection peak results of the multi-graded Ta/TaN coatings, with the application of varying N2 concentrations using HiPIMS, on AISI 52100 steel.
The Rigaku DMax-2200 X-ray diffraction (XRD) system was used for phase identification with a wavelength of 1.5405 and a diffraction angle of 20-80°. And these data obtained were visualized with the help of Origin 2022 drawing program.
5-Figure 4. Critical load values and failure modes of TaTaN multilayer thin films.
In this data presents the scratch test results for TaTaN multilayer thin film (R1, R2 and R3). The CSM Instruments scratch tester, equipped with a Rockwell C diamond indenter with a 200-tip radius, was used to examine the adhesion property (critical load value) of coating with a progressive loading rate of 100 N/min.
6-Figure 5. The coefficient of friction of AISI 52100 steel and TaTaN coatings for R1, R2, and R3 samples.
In this data presents the pin-on-disk test results for 52100 and TaTaN multilayer thin film (R1, R2 and R3). The coefficients of friction of the Ta/TaN coatings and 52100 were assessed under specific conditions, including a 1 N load, 10 cm/s velocity, and a 6.25 mm diameter Al2O3 counterpart, using the CSM tribotester system. These parameters allowed for a comprehensive understanding of the coatings' frictional properties and their potential applications in the tribological field.
And these data obtained were visualized with the help of Origin 2022 drawing program.
Methods
In this article, the authors synthesised Ta/TaN multilayer coatings using CFUBMS-HiPIMS coating system and applied mechanical and tribological tests to these synthesised coatings. The data obtained from these tests were processed with drawing programmes and presented.