Data from: Tuning optical properties of densified silica glass via high pressure and ultrafast laser excitation
Data files
Apr 21, 2026 version files 1.87 MB
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fig1.csv
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fig10A_Inset1.bmp
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fig10A_Inset2.bmp
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fig10A.csv
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fig10B.csv
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fig2_ColorLegend_G_H.bmp
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fig2_ColorLegend_I-L_Q-T.bmp
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fig2_ScaleBar.bmp
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fig2A.bmp
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fig2B.bmp
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fig2C.bmp
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fig2D.bmp
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fig2U.csv
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fig3A.csv
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fig3B.csv
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fig4A.csv
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fig4B.csv
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fig4C.csv
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fig5.csv
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fig6.csv
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fig7.csv
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fig8A.csv
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fig8B_Inset.bmp
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fig8B.csv
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fig9A.csv
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README.md
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Abstract
Silica glass exhibits diverse structural configurations accompanied by densification under varying temperature and pressure conditions; these factors significantly influence its optical properties, such as the refractive index. However, the fundamental structural mechanisms underlying the optical properties change induced by high-pressure/high-temperature (HPHT) and femtosecond laser direct writing (FLDW) remain incompletely resolved. Herein, we report the similarities and differences in the optical responses of densified silica glass induced by these two methods. The most significant difference is that the laser-irradiated region evolves toward a glass structure characteristic of a high fictive temperature (1600−2000 K) by incorporating non-bridging oxygen defects associated with edge-sharing SiO4 tetrahedra, which induces distinctly different photoluminescence behaviors compared to high-pressure treatment. Our findings demonstrate the ability to locally tailor the glass structure to exhibit unique optical characteristics, thereby enabling the flexible design of optical communication systems and photoelectric fusion devices.
We have submitted our raw data included in our manuscript titled "Tuning optical properties of densified silica glass via high pressure and ultrafast laser excitation".
Descriptions
fig1.csv
Figure 1 | Linear correlation between density change (Δρ) and refractive index change (Δn) in silica glass.
The refractive index changes (Δn) are presented as a function of density change (Δρ) induced by femtosecond laser direct writing (FLDW) and high-pressure/high-temperature (HPHT) treatments. Data for FLDW were taken from Ponader et al. (36), Bressel et al. (42), Chan et al. (43), and Zhong et al. (44) and for HPHT from Guerette et al. (14) and Masuno et al. (45). The result from our HPHT experiment at 673 K is also plotted using a star symbol. The dotted line represents a linear fit obtained using reference data from various structural modification methods.
fig2A.bmp, fig2B.bmp, fig2C.bmp, fig2D.bmp, fig2E.bmp, fig2F.bmp
fig2M.bmp, fig2N.bmp, fig2O.bmp, fig2P.bmp
Figure 2 | Pressure resistance of Type II modification in silica glass.
Transmission optical microscope images of the laser-irradiated regions. (A) Pristine uncompressed glass, (B) Uncompressed glass after annealing at 673 K for 1 h, (C-F) Glass after FLDW following HPHT treatment, and (M-P) Glass after HPHT treatment following FLDW. Applied pressures: (C, M) 1.4 GPa, (D, N) 2.5 GPa, (E, O) 3.7 GPa, and (F, P) 4.9 GPa. The laser pulse energy was 0.8 µJ.
fig2G.bmp, fig2H.bmp, fig2I.bmp, fig2J.bmp, fig2K.bmp, fig2L.bmp
fig2Q.bmp, fig2R.bmp, fig2S.bmp, fig2T.bmp
Figure 2 | Pressure resistance of Type II modification in silica glass.
Polarization microscope images of the laser-irradiated regions. (G) Pristine uncompressed glass, (H) Uncompressed glass after annealing at 673 K for 1 h, (I-L) Glass after FLDW following HPHT treatment, and (Q-T) Glass after HPHT treatment following FLDW. Applied pressures: (I, Q) 1.4 GPa, (J, R) 2.5 GPa, (K, S) 3.7 GPa, and (L, T) 4.9 GPa. The laser pulse energy was 0.8 $\mu$J.
fig2_ColorLegend_G_H.bmp
Color legend for fig2G.bmp and fig2H.bmpv
fig2_ColorLegend_I-L_Q-T.bmp
Color legend for fig2I-L.bmp and fig2Q-T.bmp
fig2_ScaleBar.bmp
Scale bar for transmission and polarization optical microscope images
fig2U.csv
Pressure resistance of Type II modification in silica glass
fig3A.csv
Figure 3 | Photoluminescence spectra from defect structures in silica glass.
Confocal photoluminescence spectra from defect structures in silica glass excited by 325 nm
fig3B.csv
Figure 3 | Photoluminescence spectra from defect structures in silica glass.
Confocal photoluminescence spectra from defect structures in silica glass excited by 532 nm
fig4A.csv
Figure 4 | Structural evaluation via Raman spectral analysis.
Confocal Raman spectra illustrate the structural changes in silica glass
fig4B.csv
Figure 4 | Structural evaluation via Raman spectral analysis.
Raman main band position as a function of applied pressure
fig4C.csv
Figure 4 | Structural evaluation via Raman spectral analysis.
Raman main band position as a function of laser pulse energy for glass samples
fig5.csv
Figure 5 | In-situ structure factor S(Q) of silica glass under high pressure.
In-situ structure factor S(Q) of silica glass under high pressure
fig6.csvs
Figure 6 | Experimentally observed structure factor S(Q) of silica glass.
Experimentally observed structure factor S(Q) of silica glas
fig7.csv
Figure 7 | Simulated structure factor S(Q) of silica glass.
Simulated structure factor S(Q) of silica glass
fig8A.csv
Figure 8 | Partial radial distribution functions and bond angle distributions.
(A) Partial radial distribution functions (RDFs) for Si-Si pairs
fig8B.csv
Figure 8 | Partial radial distribution functions and bond angle distributions.
(B) Si-O-Si bond angle distributions obtained from simulations
fig8B_Inset.bmp
Figure 8 | Partial radial distribution functions and bond angle distributions.
edge-sharing SiO$_{4}$ tetrahedral configuration
fig9A.csv
Figure 9 | Local pressure, periodic fluctuation, and coherence length in silica glass.
(A) Local pressure as a function of the Raman parameter $\sigma$
fig9B.csv
Figure 9 | Local pressure, periodic fluctuation, and coherence length in silica glass.
(B) Periodic fluctuation and coherence length calculated from the Q1 peak analysis
fig10A.csv
Figure 10 | Distribution of the translational order parameter z for simulated glass structures.
(A) z-distribution evaluated over the entire simulation region
fig10B.csv
Figure 10 | Distribution of the translational order parameter z for simulated glass structures.
(B) z-distribution calculated specifically for atoms within the locally heated region
fig10A_Inset1.bmp
Figure 10 | Distribution of the translational order parameter z for simulated glass structures.
typical configurations of silicon tetrahedral networks at z ~ 2.5
fig10A_Inset2.bmp
Figure 10 | Distribution of the translational order parameter z for simulated glass structures.
typical configurations of silicon tetrahedral networks at z ~ 1.5
